Duration of the project
15.01.2017. - 15.11.2017.
Countries and institutions involved in the project
Aim of the project
The aim of the present project is to investigate the stress relaxation mechanism in the Si-SiO2 system using EPR, IR absorption spectroscopy, scanning electron microscopy and samples deflection measurements.
Main activities of the project
Riga Technical University, 3/7 Paula Valdena Str.LV-1048, Riga, Latvia.
Si-SiO2 system investigation by different methods (EPR, TEM, CV, IR absorption spectroscopy)
Samples ordering in Semiconductor plant ALFA, PD modification by laser irradiation.
Forschungszentrum Julich. and Centre De Physique Molequlaire Optique Et Hertzienne. CNRS-Universite Bordeaux
The study of the obtained results in nanobiotechnology development.
Target group and number of persons involved
The direct aim group of the project will disseminate the obtained results, presenting them in conferences and in scientific seminars of Riga Technical University and Forschungszentrum Jülich. Peter Grünberg Institute, as well as publishing scientific paper in journals with high enough impact factor, which are cited in SpringerLink, SCOPUS, DBLP and Thomson Reuters (ISI WEB of Knowledge) data bases. Totally, we plan at least 1 publication as well as participation in 1 conference and 2 seminars. It is planned to organize a seminar about the topics of project during its execution. The number of persons involved in direct target group is 5: Prof. Dr.habil.Phys. Arturs Medvids;Prof. Dr.rer.nat. Svetlana Vitusevich; Dr.phys. Daniel Kropman; Dr. phys. Pavels Onufrijevs; Dr. habil Janis Kliava
Indirect (Public not directly involved in the project activities):
The indirect target group of the project will get the information about the obtained scientific results, participating in seminars, as well as from the published scientific papers in the above-mentioned data bases. In this way, the access to the project results will be ensured for the indirect target group. These results will be used in the education process as a complement to recent achievements in science, as well as in the development of new directions of manufacturing. The number of persons involved in indirect target group is 20.